| 摘要 |
<P>PROBLEM TO BE SOLVED: To form a high-quality thin film on the surface of a substrate while preventing the wasteful use of a vapor deposition material. <P>SOLUTION: A vapor deposition apparatus comprises a holder 13 for holding a substrate 6, multiple containers 1, an energy generator 5, a moving mechanism 2 and a weight measuring mechanism 4. Multiple containers 1 house the vapor deposition material which is a raw material of the thin film to be formed on the substrate 6. The energy generator 5 is positioned facing the holder 13, and generates energy for vaporizing the vapor deposition material housed in the container 1. The moving mechanism 2 moves one container 1 selected from multiple containers 1 to a vapor deposition position at which the energy generated from the energy generator 5 is imparted. The weight measuring mechanism 4 measures the weight of the vapor deposition material in the container 1. <P>COPYRIGHT: (C)2013,JPO&INPIT |
