LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRAPHIC METHOD
摘要
In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a deflector to displace the plurality of beams with respect to an exposure area.
申请公布号
WO2012136434(A3)
申请公布日期
2012.12.13
申请号
WO2012EP53918
申请日期
2012.03.07
申请人
ASML NETHERLANDS B.V.;DE JAGER, PIETER;BANINE, VADIM;ONVLEE, JOHANNES;STEVENS, LUCAS;WUISTER, SANDER;IOSAD, NIKOLAY
发明人
DE JAGER, PIETER;BANINE, VADIM;ONVLEE, JOHANNES;STEVENS, LUCAS;WUISTER, SANDER;IOSAD, NIKOLAY