| 摘要 |
<p>[Problem] To provide a novel block copolymer, a method for producing the same, and a lithographic resist underlayer film-forming composition using the block copolymer. [Solution] A block copolymer having a structure represented by formula (1), where P and Q each independently represent a divalent organic group between two carbon atoms; s, t, and u each independently represent an integer 10 or higher; the two R1s each independently represent a hydrogen atom or methyl group; the two R2s each independently represent a hydrogen atom, phenyl group, benzyl group, naphthyl group, anthracenyl group, C1-13 alkyl group, or a group including a lactone ring, at least one hydrogen atom of the phenyl group, naphthyl group, anthracenyl group, or alkyl group being optionally substituted by a hydroxyl group, C1-13 alkoxy group, or halogen atom; and the two X's each independently represent an ester bond, an amide bond, or a single bond.</p> |
