发明名称 MASKLESS PROCESSING APPARATUS
摘要 Disclosed herein is a maskless processing apparatus including: an illumination optical system providing light illuminated to a substrate; a spatial light modulator (SLM) including a plurality of light conversion devices and controlling corresponding light conversion devices to selectively reflect or transmit the light illuminated from the illumination optical system according to a processing pattern, thereby converting a light amount; a projection optical system arranged so that the plurality of light conversion devices collect light corresponding to a single pixel of the substrate and projecting high energy light provided by the plurality of corresponding light conversion devices to a corresponding pixel when the light converted from the SLM is input; and a controller controlling the SLM to receive the processing pattern and selectively convert the light illuminated from a light source through the plurality of light conversion devices according to the received processing pattern. A digital mask is used, thereby reducing a use cost of a mask, easily taking active action against a change in scale of a product to be processed, and increasing the utilization of maskless processing apparatus.
申请公布号 US2012314197(A1) 申请公布日期 2012.12.13
申请号 US201113251918 申请日期 2011.10.03
申请人 NA GI LYONG;SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 NA GI LYONG
分类号 G03B27/54 主分类号 G03B27/54
代理机构 代理人
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