发明名称 |
Semiconductor device, mask for fabrication of semiconductor device, and optical proximity correction method |
摘要 |
A semiconductor device includes a circuit portion including at least one real feature, and a plurality of dummy feature groups each including a plurality of dummy features spaced apart from each other by a first distance. The plurality of dummy feature groups are spaced apart from each other by a second distance larger than the first distance, and the circuit portion and the plurality of dummy feature groups are spaced apart from each other by the second distance. |
申请公布号 |
US8330248(B2) |
申请公布日期 |
2012.12.11 |
申请号 |
US201113014346 |
申请日期 |
2011.01.26 |
申请人 |
TABATA YASUKO;MISAKA AKIO;HIRAI TAKEHIRO;ARAI HIDEYUKI;NONAMI YUJI;PANASONIC CORPORATION |
发明人 |
TABATA YASUKO;MISAKA AKIO;HIRAI TAKEHIRO;ARAI HIDEYUKI;NONAMI YUJI |
分类号 |
G03F1/36;G03F1/68;G03F1/70 |
主分类号 |
G03F1/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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