EXPOSURE APPARATUS, EXPOSURE METHOD, MANUFACTURING METHOD FOR DISPLAY PANEL SUBSTRATE AND INSPECTION METHOD FOR EXPOSURE APPARATUS

摘要

PROBLEM TO BE SOLVED: To reduce distortion of light beam output from a light beam irradiation device and improve drawing accuracy.

SOLUTION: An exposure apparatus comprises: a first image acquisition device (CCD camera 51) that is provided at a chuck 10; and a reticle 2 that is provided with a testing pattern and is arranged between a head part of a light beam irradiation device 20 and the first image acquisition device. The exposure apparatus executes steps of: supplying drawing data for testing to a drive circuit of the light beam irradiation device 20; using the first image acquisition device to acquire an image of the testing pattern 2a of the reticle 2 and an image 2c of light beam incident from the light beam irradiation device 20; detecting displacement of the light beam on the basis of the image of the testing pattern 2a of the reticle 2 and the image 2c of the light beam that are acquired by the first image acquisition device, and detecting distortion of the light beam; correcting a coordinate of drawing data for exposure on the basis of a result of detecting the distortion of the light beam; and supplying the drawing data for exposure to the drive circuit of the light beam irradiation device 20.

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