发明名称 INTERMEDIATE BASE ISOLATION STRUCTURE UTILIZING FLAT INVERSE BEAM
摘要 <P>PROBLEM TO BE SOLVED: To provide a base isolation structure in which a base isolation layer and lower floors can be efficiently utilized by combining a flat inverse beam to an intermediate base isolation structure and accommodating a base isolation device smartly while suppressing a height of the base isolation layer in addition to structural advantages. <P>SOLUTION: A flat inverse beam 2 which is used also as a pedestal is used as a beam of an outer peripheral part of a base isolation layer slab 3 forming a base isolation layer M of an intermediate base isolation structure, and a base isolation device 5 is installed on the flat inverse beam 2. An upper part of the flat inverse beam 2 is projected on an upper surface of the outer peripheral part of the base isolation layer slab 3 and forms a shallow recessed part inside and that portion is used as a piping pit. An underground pit portion is used as a piping pit h<SB POS="POST">2</SB>for a first floor entrance e. An erected wall 6 is provided in an outer terminal portion of an outer peripheral chamber of the flat inverse beam 2, and each expansion spacing is formed under a lower surface of a veranda 18 of an upper floor and under a lower surface of an outside corridor 19. In such a state, weathering is facilitated while allowing horizontal movement in the base isolation layer M. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012241398(A) 申请公布日期 2012.12.10
申请号 JP20110111657 申请日期 2011.05.18
申请人 SUMITOMO FUDOSAN KK;ORIMOTO STRUCTURAL ENGINEERS 发明人 OGAWARA KIYOSHI;NAKAZAWA AKINOBU;FUKAZAWA MASAHIKO
分类号 E04H9/02;E04B1/98 主分类号 E04H9/02
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