| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography apparatus which is advantageous for compensating ununiformity among a plurality of charged particle beams. <P>SOLUTION: A lithography apparatus includes: an irradiation system (140); an aperture array (117); a lens array (119) forming a plurality of crossovers; and a projection system (170) including an element (122) having a plurality of openings and a plurality of projection units. The lens array (119) includes: a correction lens array (162) having a focus lens which is eccentric with respect to the openings so that the respective positions of the plurality of crossovers match with the corresponding openings on the element; and a magnifying lens array (163) forming an image by respectively magnifying the plurality of crossovers formed by the correction lens array so as to form the plurality of crossovers. <P>COPYRIGHT: (C)2013,JPO&INPIT |
