POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a positive resist composition capable of reducing defects and to provide a method for forming a resist pattern using the resist composition.

SOLUTION: The positive resist composition includes: a base component (A) the solubility of which with an alkali developing solution increases by an action of an acid; an acid generator component (B) generating an acid by exposure; a fluorine-containing compound component (F); and a photosensitizer (G). The fluorine-containing compound component (F) preferably includes a resin component (F1) having a structural unit (f1) containing a fluorine atom, the structural unit derived from an acrylate in which an atom except for a hydrogen atom or a substituent may be bonded to a carbon atom at an α-position; and the structural unit (f1) is preferably a structural unit expressed by formula (f1-1).

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