发明名称 |
SEMICONDUCTOR DEVICE, SEMICONDUCTOR PACKAGE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a highly reliable semiconductor device. <P>SOLUTION: A semiconductor device comprises: an N-type substrate 10; a P-type well 40 provided on one surface side of the N-type substrate 10; a P-type high concentration impurity region 42 provided in the P-type well 40; a MOS transistor 20 including an N-type source-drain region provided in the P-type well 40; and a MOS transistor 30 provided on the one surface side of the N-type substrate 10 and including a source-drain region electrically connected with the P-type high concentration impurity region 42 on one side and grounded on another side. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2012243930(A) |
申请公布日期 |
2012.12.10 |
申请号 |
JP20110112151 |
申请日期 |
2011.05.19 |
申请人 |
RENESAS ELECTRONICS CORP |
发明人 |
KATO HIROO |
分类号 |
H01L27/06;H01L21/822;H01L21/8234;H01L27/04;H01L27/088;H01L29/78 |
主分类号 |
H01L27/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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