METHOD FOR MANUFACTURING PIEZOELECTRIC FILM ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a piezoelectric film element capable of microfabricating a piezoelectric film layer in a short time by wet etching and selectively stopping microfabrication in a lower electrode layer.

SOLUTION: A method for manufacturing a piezoelectric film element 1 comprises the steps of: forming a lower electrode 3 on a substrate 2; forming a piezoelectric film layer 4 of alkali niobium oxide-based perovskite structure represented by formula (K1-xNax)NbO3on the lower electrode 3; and wet-etching the piezoelectric film layer 4. The wet-etching step uses a hydrofluoric acid-based etching liquid using a Cr film 6 as a mask.

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