| 摘要 |
A substrate holder adapted to hold and retain a substrate during vertical fluid processing of a surface of the substrate. The wafer holder has a frame. A first leg is coupled to the frame by a first compliant flexure, the first leg having a first contact member configured to engage a first edge of the substrate. A second leg is coupled to the frame by a second compliant flexure, the second leg having a second contact member configured to engage a second edge of the substrate. Upon deflection of the first and second compliant flexures, the first and second legs are moveable in substantially opposite directions disengaging the first and second contact fingers from the first and second edges of the substrate respectively. |
