发明名称 METHOD FOR CONTINUOUSLY REFINING SILICON
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for refining silicon, which can efficiently remove impurities such as boron and others from a metal-grade silicon material, can continuously process, and can produce a high-purity silicon by a compact apparatus structure. <P>SOLUTION: A metal-grade silicon or a silica powder 1 is charged in a plasma region 8 of an ozone-containing oxygen gas atmosphere at about 2,400&deg;C to oxidize boron contained in the powder and to remove boron as a vaporized substance, and the resultant powder is recovered as a powder 1a. The powder 1a after removal of boron is charged in a plasma region 28 of a reductive atmosphere to remove oxygen by reduction and to recover a silicon powder 1b. The silicon powder is heated to make a melt 1c, and the melt 1c is made to flow in a magnetic field of an electromagnet 35 to trap and remove metal impurity elements. The silicon melt 1c from which metal impurity elements have been removed is recovered as a silicon powder 1d by centrifugal spraying. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012236723(A) 申请公布日期 2012.12.06
申请号 JP20110104951 申请日期 2011.05.10
申请人 SANKI DENGYO KK 发明人 OKA HIROAKI;OKA NARIAKI
分类号 C01B33/037 主分类号 C01B33/037
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