EXPOSURE APPARATUS, LIQUID CRYSTAL DISPLAY DEVICE, AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE

摘要

This invention provides an exposure apparatus that can inhibit visual recognition of display unevenness at a joint portion even if scanning temporarily stops during scanning exposure, as well as a liquid crystal display device and a method for manufacturing the liquid crystal display device. This invention is an exposure apparatus for exposing a photoalignment film provided on a substrate. The exposure apparatus includes a light source and a photomask, and exposes the photoalignment film through the photomask while scanning the light source or the substrate. When a direction in which the light source or the substrate is scanned is taken as a scanning direction, and a direction that is orthogonal to the scanning direction is taken as a vertical direction, the photomask includes a first region and a second region that is adjacent to the first region in the vertical direction. The first region includes a plurality of first transparent portions inside a first light-shielding portion. The plurality of first transparent portions are arranged in the vertical direction. The second region includes a plurality of second transparent portions inside a second light-shielding portion. The plurality of second transparent portions are smaller than the plurality of first transparent portions. The plurality of second transparent portions are arranged in the vertical direction and are discretely dispersed in the scanning direction.