| 摘要 |
<p>PURPOSE: A photosensitive pattern and a manufacturing method thereof are provided to reduce defective products by exposing a photosensitive film to an exposure apparatus in which exposure pattern data is inputted. CONSTITUTION: A thin film(210) is formed on a substrate. A photosensitive film(300) is formed on the thin film. An exposure apparatus(100) including an optical modulation device is arranged on the photosensitive film. Exposure pattern data is inputted to the optical modulation device. The photosensitive film is exposed using the exposure apparatus. A photosensitive pattern is formed by forming the exposed photosensitive film.</p> |
