发明名称 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus, or the like, in which trial operation can be carried out efficiently in conditions close to actual operation. <P>SOLUTION: In the substrate processing apparatus 1 where a substrate W is taken out from a transfer vessel (FOUP1-4) and processed in a processing module 2 before being returned back to the original transfer vessel, a selection unit 31 accepts the selection of the operation confirmation mode of substrate transfer mechanisms 15, 17 or the processing module 2, a job setting unit 32 sets a plurality of control jobs (CJ) for operation confirmation, and sets a process job (PJ), i.e. a recipe being run for the substrate W, for each CJ, and a control unit 3 determines whether or not the PJs of two CJs having reversed orders can be run in parallel. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012235087(A) 申请公布日期 2012.11.29
申请号 JP20120038947 申请日期 2012.02.24
申请人 TOKYO ELECTRON LTD 发明人 MATSUMOTO TAKESHI
分类号 H01L21/02;H01L21/304;H01L21/677 主分类号 H01L21/02
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