| 摘要 |
<P>PROBLEM TO BE SOLVED: To perform a desired projection exposure with the proper amount of exposure even if an emission spectrum of a light source fluctuates in time. <P>SOLUTION: An exposure apparatus for exposing a pattern formed on a mask to an object via an optical system using light from a light source, includes: a first sensor device having a first spectral sensitivity in a wavelength region containing a wavelength component of exposure light used for exposure to the object; and a second sensor device having a second spectral sensitivity different from the first spectral sensitivity in the wavelength region, and also includes a measuring device which measures intensity for every wavelength of the exposure light based on a detection result detected by the first sensor device and the second sensor device. <P>COPYRIGHT: (C)2013,JPO&INPIT |
