| 摘要 |
The invention concerns a mould for lithography by nano-imprinting, together with its manufacturing methods. This mould has a face which includes n structured zone(s) with patterns of micrometric or nanometric size, where n is an integer greater than or equal to 1. This structured face belongs to a first layer which is supported by a second layer, where the first layer is made of a rigid material and the second layer is made of a flexible material. This mould may also include n intervening layers positioned between the first layer and the second layer, where n is an integer greater than or equal to 1, and in which the Young's modulus of the second layer is lower than the Young's modulus of the nth intervening layer adjacent to the second layer, and if n is greater than 1, the Young's modulus of the (i)th intervening layer is greater than the Young's modulus of the (i+1)th intervening layer, with i=1 to (n−1).
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