发明名称 METHOD OF FORMING PROCESS FOR VARIABLE RESISTIVE ELEMENT AND NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE
摘要 A method of a forming process for a variable resistive element, which is performed in short time comparable to the pulse forming and a writing current in a switching action is the same level as that of the DC forming, is provided. In the forming process, a variable resistive element is changed by voltage pulse application from an initial high resistance state just after produced to a variable resistance state where the switching action is performed. The forming process includes a first step of applying a first pulse having a voltage amplitude lower than a threshold voltage at which the resistance of the variable resistive element is lowered, to between both electrodes of the variable resistive element, and a second step of applying a second pulse having a voltage amplitude having the same polarity as the first pulse and not lower than the threshold voltage, thereto after the first step.
申请公布号 US2012300532(A1) 申请公布日期 2012.11.29
申请号 US201213478498 申请日期 2012.05.23
申请人 YAMAZAKI SHINOBU;ISHIHARA KAZUYA;KAWABATA SUGURU 发明人 YAMAZAKI SHINOBU;ISHIHARA KAZUYA;KAWABATA SUGURU
分类号 G11C11/21;H01L21/02 主分类号 G11C11/21
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