发明名称 |
METHOD FOR DEPOSITING LAYERS ON A GLASS SUBSTRATE BY MEANS OF LOW-PRESSURE PECVD |
摘要 |
The invention relates to a method for producing metal or semiconductor oxide, nitride or oxynitride films on a substrate, by means of the PECVD method, including the steps that involve: (i) having a low-pressure PECVD device including at least one plasma source that includes at least one electrode connected to an AC, DC, or drawn DC generator for depositing said films on the substrate; and (ii) applying electrical power to the plasma source and applying, on the substrate, an oxide film gas precursor made of metal or semiconductor nitrides or oxynitrides and a reactive gas made of oxygen, oxygen derivatives, or nitrogen derivatives. The invention also relates to metal or semiconductor oxide, nitride, or oxynitride films obtained by the method. |
申请公布号 |
WO2012160145(A1) |
申请公布日期 |
2012.11.29 |
申请号 |
WO2012EP59734 |
申请日期 |
2012.05.24 |
申请人 |
AGC GLASS EUROPE;MAHIEU, STIJN;TIXHON, ERIC;VAN STUYVENBERG, MARTIN;WIAME, HUGUES |
发明人 |
MAHIEU, STIJN;TIXHON, ERIC;VAN STUYVENBERG, MARTIN;WIAME, HUGUES |
分类号 |
C23C16/40;C23C16/34;C23C16/503 |
主分类号 |
C23C16/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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