发明名称 MATERIAL FOR CONDUCTIVE FILM, CONDUCTIVE FILM LAMINATE, ELECTRONIC APPARATUS, AND METHOD FOR PRODUCING MATERIAL FOR CONDUCTIVE FILM, CONDUCTIVE FILM LAMINATE AND ELECTRONIC APPARATUS
摘要 <p>Provided is a material for a conductive film exhibiting crystallinity and whereby it is possible to obtain a crystalline transparent conductive film having a thickness and sheet resistance within a preferred range. A material (1) for a conductive film has a transparent base material (2), a first amorphous layer (4), and a second amorphous layer (5). The first amorphous layer (4) is laminated on the transparent base material (2) and is formed from an indium tin oxide containing 2 to 15 mass % of tin in terms of oxides. Moreover, the second amorphous layer (5) is laminated on the first amorphous layer (4) and is formed from an indium tin oxide containing 2 to 15 mass % of tin in terms of oxides. The content of tin in the second amorphous layer (5) is different from the content of tin in the first amorphous layer (4) in terms of oxides.</p>
申请公布号 WO2012161095(A1) 申请公布日期 2012.11.29
申请号 WO2012JP62696 申请日期 2012.05.17
申请人 ASAHI GLASS COMPANY, LIMITED;YOSHIOKA, KAZUHISA;TOMIDA, MICHIHISA;MORINO, MASAYUKI 发明人 YOSHIOKA, KAZUHISA;TOMIDA, MICHIHISA;MORINO, MASAYUKI
分类号 H01B5/14;B32B7/02;C23C14/08;H01B13/00 主分类号 H01B5/14
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