| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a barrel-type vapor-phase growth apparatus which can reduce the amount of a reaction product peeled from the inside of a bellows pipe, and can suppress the amount of particles loaded from an exhaust passage to a reaction chamber. <P>SOLUTION: A sleeve having a smaller diameter than a bellows pipe is inserted into the bellows pipe in a cantilevered state only with an upstream-side pipe section. Therefore, most of a reaction product is attached to an inner peripheral surface of the sleeve of a gas exhaust pipe in the region of the bellows pipe. Even if the bellows pope is deformed due to a vibration of the apparatus or the like, the amount of particles peeled from the bellows pipe is small, thereby decreasing the amount of the particles loaded into the reaction chamber than that in a conventional apparatus. Consequently, the amount of the particles attached to a semiconductor wafer can be reduced. <P>COPYRIGHT: (C)2013,JPO&INPIT |
