| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an active ray-sensitive or radiation-sensitive resin composition, from which a pattern excellent in a pattern profile, roughness performance and over exposure margin can be formed, and to provide a resist film and a pattern forming method using the composition. <P>SOLUTION: The active ray-sensitive or radiation-sensitive resin composition includes: (A) a resin the solubility of which with an alkali developing solution increases by an action of an acid; (B) an onium salt compound, which includes a nitrogen atom in a cation moiety and is decomposed by irradiation with active rays or radiation to generate an acid; (C) a compound expressed by general formula (C-I) or a compound having a structure of a plurality of compounds expressed by general formula (C-I) bonded by connecting groups; and (G) a solvent. <P>COPYRIGHT: (C)2013,JPO&INPIT |
