PROXIMITY EXPOSURE APPARATUS, METHOD FOR ALIGNING PROXIMITY EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DISPLAY PANEL SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To shorten a tact time by quickly moving alignment marks of a substrate and an image acquisition device to positions relatively suited to an image recognition for each shot and quickly positioning a mask and the substrate.

SOLUTION: In a first substrate, the position of a chuck after the alignment of the substrate and the position of each image acquisition device are stored for each shot as registered positions of the shot. In a second or later substrate, the chuck and each image acquisition device are moved for each shot to the registered positions of the shot by a stage and each moving mechanism so as to bring alignment marks of the mask and of the substrate into view of each image acquisition device. Based on the positions of the alignment marks of the mask and the positions of the alignment marks of the substrate detected by an image processing device, the chuck is moved by the stage so as to align the substrate.

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