发明名称 |
Method and computer-readable medium of optical proximity correction |
摘要 |
A method optical proximity correction includes the following steps. First, a layout of an integrated circuit with an exposure intensity specification is provided. The integrated circuit includes a plurality of patterns and each pattern has an exposure intensity distribution. Second, a quadratic polynomial equation of each exposure intensity distribution is approximated. Third, a local extreme intensity of each exposure intensity distribution is computed by fitting the quadratic polynomial equation. Fourth, the local extreme intensity is determined whether violating the exposure intensity specification or not. Then, the layout is corrected when the local extreme intensity violates the exposure intensity specification. |
申请公布号 |
US8321822(B2) |
申请公布日期 |
2012.11.27 |
申请号 |
US20100788375 |
申请日期 |
2010.05.27 |
申请人 |
YANG YU-SHIANG;CHEN MING-JUI;WU TE-HUNG;UNITED MICROELECTRONICS CORP. |
发明人 |
YANG YU-SHIANG;CHEN MING-JUI;WU TE-HUNG |
分类号 |
G06F17/50;G03C5/00;G03F1/00 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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