发明名称 HIGH ELECTRON ENERGY BASED OVERLAY ERROR MEASUREMENT METHODS AND SYSTEMS
摘要 A method, a system and a computer readable medium are provided. The method may include obtaining or receiving first area information representative of a first area of a first layer of an inspected object; wherein the inspected object further comprises a second layer that comprises a second area; wherein the second layer is buried under the first layer; directing electrons of a primary electron beam to interact with the first area; directing electrons of the primary electron beam to interact with the second area; generating detection signals responsive to electrons that were scattered or reflected from at least one of the first and second areas; and determining at least one spatial relationship between at least one feature of the first area and at least one feature of the second area based on the detection signals and on the first area information.
申请公布号 US2012292502(A1) 申请公布日期 2012.11.22
申请号 US201113111838 申请日期 2011.05.19
申请人 LANGER MOSHE;ADAN OFER;PELTINOV RAM;UZIEL YORAM;SHOVAL ORI 发明人 LANGER MOSHE;ADAN OFER;PELTINOV RAM;UZIEL YORAM;SHOVAL ORI
分类号 G01N23/20;G01N23/00 主分类号 G01N23/20
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