发明名称 |
PELLICLE, PRESSURE-SENSITIVE ADHESIVE FOR PELLICLE, PHOTOMASK WITH PELLICLE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
<p>Provided is a pellicle which has a pressure-sensitive adhesive generating little outgas and with which it is possible to reduce paste residue when peeled from a photomask after exposure. This pellicle comprises a pellicle frame, a pellicle film provided in a tensioned state on one end of the pellicle frame, and a pressure-sensitive adhesive adhering to the other end of the pellicle frame, wherein the pressure-sensitive adhesive comprises a (meth)acrylic acid alkyl ester copolymer and a silane compound, the (meth)acrylic acid alkyl ester copolymer being a copolymer of a monomer having a reactive functional group of (meth)acrylic acid alkyl ester having an alkyl group with carbon number of 4 to 14, with at least either an isocyanate group or an epoxy group.</p> |
申请公布号 |
WO2012157759(A1) |
申请公布日期 |
2012.11.22 |
申请号 |
WO2012JP62831 |
申请日期 |
2012.05.18 |
申请人 |
ASAHI KASEI E-MATERIALS CORPORATION;YANO KOHEI;YAMASHITA DAIKI |
发明人 |
YANO KOHEI;YAMASHITA DAIKI |
分类号 |
G03F1/62;B65D85/86 |
主分类号 |
G03F1/62 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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