发明名称 LIQUID TREATMENT DEVICE AND LIQUID TREATMENT METHOD
摘要 <p>The present invention has a first electrode (104) at least one part of which is disposed inside a treatment tank (109) into which is put a liquid (110), a second electrode (102) at least one part of which is disposed inside the treatment tank, a bubble generating unit which generates bubbles (106) in the liquid when the liquid is in the treatment tank and generates the bubbles (106) such that at least a surface on which a conductor is exposed, out of the surfaces of the first electrode (104) positioned in the treatment tank, is positioned within the bubbles (106), a gas supply device (105) that supplies a gas in an amount necessary for generating the bubbles to the bubble generating unit from outside of the treatment tank, and a power supply (101) that applies a voltage across the first electrode and the second electrode.</p>
申请公布号 WO2012157034(A1) 申请公布日期 2012.11.22
申请号 WO2011JP07272 申请日期 2011.12.26
申请人 PANASONIC CORPORATION;IMAI, SHIN-ICHI 发明人 IMAI, SHIN-ICHI
分类号 C02F1/48 主分类号 C02F1/48
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