| 摘要 |
<P>PROBLEM TO BE SOLVED: To form a silicon (Si) fine particle having high surface stability and a particle size of at least several hundreds nm or less from a silicon substrate, and create a solar cell by using it. <P>SOLUTION: By dispersion treating the Si fine particle which is obtained from a silicon substrate by pulverizing it and thereafter pulverizing it by a bead mill method and has at least a particle size of several hundreds nm or less, only in a hydrofluoric acid aqueous solution (HF), the Si fine particle can be achieved which exhibits a low spontaneous oxide fim growth and has high surface stability in such that the SiO<SB POS="POST">2</SB>layer on the Si particle surface after the treatment is about zero, and the SiO<SB POS="POST">2</SB>layer thickness is at most about 0.6 nm even if it is left in the atmosphere for one month, and a solar cell is created by using it. <P>COPYRIGHT: (C)2013,JPO&INPIT |
