发明名称 SIC SINGLE CRYSTAL, SIC WAFER, AND SEMICONDUCTOR DEVICE
摘要 <p>Provided are an SiC single crystal having one or more orientation regions where linearity of basal plane dislocations is high, and the basal plane dislocations are oriented in the three crystallographically equivalent <11-20> directions, and an SiC wafer and a semiconductor device manufactured from such an SiC single crystal. This SiC single crystal can be manufactured by using a seed crystal that has a small offset angle on the {0001} plane highest portion side and a large offset angle on the offset direction downstream side, and growing a new crystal on the seed crystal.</p>
申请公布号 WO2012157654(A1) 申请公布日期 2012.11.22
申请号 WO2012JP62448 申请日期 2012.05.16
申请人 KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO;TOYOTA JIDOSHA KABUSHIKI KAISHA;DENSO CORPORATION;GUNJISHIMA ITARU;URAKAMI YASUSHI;ADACHI AYUMU 发明人 GUNJISHIMA ITARU;URAKAMI YASUSHI;ADACHI AYUMU
分类号 C30B29/36;H01L29/161 主分类号 C30B29/36
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