Injector for a vacuum vapour deposition system

摘要

The present invention concerns an injector for a vacuum vapour deposition system, said injector comprising an injection duct suitable for receiving vaporized materials from a vacuum evaporation source and a diffuser comprising a plurality of nozzles for diffusing said vaporized materials into a vacuum deposition chamber, each nozzle comprising a channel suitable for connecting said injection duct to said deposition chamber. According to the invention, said diffuser has a spatially varying nozzle distribution. The invention also concerns a process for calibrating an injector and a process for manufacturing a diffuser for an injector.