| 摘要 |
<p>PURPOSE: A resist composition and a pattern forming method are provided to form fine hole patterns of high sensitivity by reducing nanoedge roughness and dissolution of exposed parts. CONSTITUTION: A resist composition includes a polymeric compound and one or more onium salt type photoacid generators. The polymeric compound includes a repeating unit with a hydroxyl group substituted with an acid-labile group represented by chemical formula 1. The onium salt type photoacid generators are selected from an onium salt type photoacid generator generating sulfonic acid represented by chemical formula 2, an onium salt type photo acid generator generating imide acid represented by chemical formula 3, an onium salt type photoacid generator generating methide acid represented by chemical formula 4, and an onium salt type photoacid generator generating carboxylic acid represented by chemical formula 5. Cations of the onium salt are sulfonium cations or iodium cations.</p> |
