发明名称 Nonvolatile memory devices that use resistance materials and internal electrodes, and related methods and processing systems
摘要 A nonvolatile memory device, a method of fabricating the nonvolatile memory device and a processing system including the nonvolatile memory device. The nonvolatile memory device may include a plurality of internal electrodes that extend in a direction substantially perpendicular to a face of a substrate, a plurality of first external electrodes that extend substantially in parallel with the face of the substrate, and a plurality of second external electrodes that also extend substantially in parallel with the face of the substrate. Each first external electrode is on a first side of a respective one of the internal electrodes, and each second external electrode is on a second side of a respective one of the internal electrodes. These devices also include a plurality of variable resistors that contact the internal electrodes, the first external electrodes and the second external electrodes.
申请公布号 US8314003(B2) 申请公布日期 2012.11.20
申请号 US201113101263 申请日期 2011.05.05
申请人 BAEK IN-GYU;SIM HYUN-JUN;ZHAO JIN-SHI;YIM EUN-KYUNG;SAMSUNG ELECTRONICS CO., LTD. 发明人 BAEK IN-GYU;SIM HYUN-JUN;ZHAO JIN-SHI;YIM EUN-KYUNG
分类号 H01L21/20 主分类号 H01L21/20
代理机构 代理人
主权项
地址
您可能感兴趣的专利