| 摘要 |
A light emitting type heat treatment apparatus includes relatively low rated power density filament lamps and relatively high rated power density filament lamps, in which a heat treatment including a temperature raising heat process for raising a work piece quickly to a predetermined heat treatment temperature by light emitted from the filament lamps, and a constant temperature heating process succeeding the temperature raising heating process in which the work piece is heated while the predetermined heat treatment temperature is maintained, and a control unit which controls lighting state of the filament lamps so that while at least filament lamps with relatively high rated power density are lighted in the temperature raising heating process, in the constant temperature heating process, only filament lamps with relatively low rated power density are lighted. |
