发明名称 Semicoductor device having a lateral double diffused MOSFET transistor with a lightly doped source and a CMOS transistor
摘要 Methods and systems for monolithically fabricating a lateral double-diffused MOSFET (LDMOS) transistor having a source, drain, and a gate on a substrate, with a process flow that is compatible with a CMOS process flow are described.
申请公布号 US8314461(B2) 申请公布日期 2012.11.20
申请号 US201113311400 申请日期 2011.12.05
申请人 YU BUDONG;ZUNIGA MARCO A.;VOLTERRA SEMICONDUCTOR CORPORATION 发明人 YU BUDONG;ZUNIGA MARCO A.
分类号 H01L0031/000313 主分类号 H01L0031/000313
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