发明名称 METHOD AND APPARATUS FOR CLEANING SEMICONDUCTOR SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To greatly improve a cleaning efficiency in a method for cleaning a substrate by the action of acoustic waves passing through a liquid in a container without substantially generating the reflection of the acoustic waves in the container. <P>SOLUTION: The substrate is placed in a tank containing a cleaning liquid at a prescribed angle with respect to the acoustic waves generated in the liquid. The angle corresponds to that of transmission, that is, the angle at which waves are not reflected off the substrate surface. A damping material is provided in the tank and is arranged to substantially absorb all waves transmitted through the substrate. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012223760(A) 申请公布日期 2012.11.15
申请号 JP20120094090 申请日期 2012.04.17
申请人 IMEC;KATHOLIEKE UNIV LEUVEN KU LEUVEN R&D 发明人 MERTENS PAUL;BREMS STEVEN;CAMEROTTO ELISABETH;HAUPTMANN MARC
分类号 B08B3/12;H01L21/304 主分类号 B08B3/12
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