发明名称 POSITIONING APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE
摘要 <p>PURPOSE: A positioning device, an exposure apparatus, and a method of manufacturing a device are provided to improve positioning accuracy by correcting a magnetic flux command value according to the size of a gap. CONSTITUTION: Electromagnets(5a,5b) are fixed to a first member(2). Aspiration targets(6a,6b) are fixed to a second member(1). The aspiration targets are absorbed by the electromagnets. A magnetic flux sensor detects a magnetic flux value generated by the electromagnets. A driving unit drives the electromagnets according to the deviation between the magnetic flux value and a correction magnetic flux command value which is obtained by correcting the magnetic flux value. [Reference numerals] (11) Current driver; (13) Magnetic flux command calculator; (15) Correction value calculator; (17) D/A converter; (AA) Main controller; (BB) Driving direction</p>
申请公布号 KR20120125187(A) 申请公布日期 2012.11.14
申请号 KR20120047430 申请日期 2012.05.04
申请人 发明人
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
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