发明名称 |
Polishing pad |
摘要 |
A polishing pad has an excellent polishing rate and is superior in longevity without generating center slow. A method of manufacturing a semiconductor device with the polishing pad is also provided. The polishing pad has a polishing layer consisting of a polyurethane foam having fine cells, wherein a high-molecular-weight polyol component that is a starting component of the polyurethane foam contains a hydrophobic high-molecular-weight polyol A having a number-average molecular weight of 550 to 800 and a hydrophobic high-molecular-weight polyol B having a number-average molecular weight of 950 to 1300 in an A/B ratio of from 10/90 to 50/50 by weight. |
申请公布号 |
US8309466(B2) |
申请公布日期 |
2012.11.13 |
申请号 |
US20060065219 |
申请日期 |
2006.08.22 |
申请人 |
OGAWA KAZUYUKI;SHIMOMURA TETSUO;NAKAI YOSHIYUKI;NAKAMORI MASAHIKO;YAMADA TAKATOSHI;TOYO TIRE & RUBBER CO., LTD. |
发明人 |
OGAWA KAZUYUKI;SHIMOMURA TETSUO;NAKAI YOSHIYUKI;NAKAMORI MASAHIKO;YAMADA TAKATOSHI |
分类号 |
H01L21/302;B24B37/20;B24B37/24;B32B3/26;B32B5/00;C08G18/65;H01L21/304;H01L21/461 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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