发明名称 METHOD FOR FORMING ELECTRODES ON SILICON CARBIDE SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for forming electrodes on a silicon carbide semiconductor device capable of suppressing peeling by improving adhesion of a metal/silicon carbide device interface of a manufactured device in the silicon carbide semiconductor device. <P>SOLUTION: A method for forming electrodes on a silicon carbide substrate includes a step of depositing a metal on which a carbide can be formed on a silicon carbide substrate on which a graphite is formed on its surface and a step of forming the carbide between a metal layer and the silicon carbide substrate by annealing the silicon carbide substrate. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012222074(A) 申请公布日期 2012.11.12
申请号 JP20110084493 申请日期 2011.04.06
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 KINOSHITA AKIMASA;TSUJI TAKASHI;IMAI BUNICHI
分类号 H01L21/28 主分类号 H01L21/28
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