发明名称 |
METHOD FOR FORMING ELECTRODES ON SILICON CARBIDE SEMICONDUCTOR DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming electrodes on a silicon carbide semiconductor device capable of suppressing peeling by improving adhesion of a metal/silicon carbide device interface of a manufactured device in the silicon carbide semiconductor device. <P>SOLUTION: A method for forming electrodes on a silicon carbide substrate includes a step of depositing a metal on which a carbide can be formed on a silicon carbide substrate on which a graphite is formed on its surface and a step of forming the carbide between a metal layer and the silicon carbide substrate by annealing the silicon carbide substrate. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2012222074(A) |
申请公布日期 |
2012.11.12 |
申请号 |
JP20110084493 |
申请日期 |
2011.04.06 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY |
发明人 |
KINOSHITA AKIMASA;TSUJI TAKASHI;IMAI BUNICHI |
分类号 |
H01L21/28 |
主分类号 |
H01L21/28 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|