| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a large-capacity vapor deposition apparatus for forming a thin film, with which the operation stop cycle of an apparatus for vapor deposition of a thin film is prolonged and the use efficiency of the apparatus is enhanced. <P>SOLUTION: In the large-capacity vapor deposition apparatus, a plurality of raw material containers 110 and a sensor 150 are provided, and the amounts of raw material substances 1 to be accommodated in the raw material containers 110 are distributed. Thereby, the heat amount required to heat the raw material substances 1 is reduced in comparison with the case where a single large-capacity raw material container is used. A state, in which the raw material substance 1 is always vaporized, is maintained in the periphery of a jetting port 130 by raising the temperature in the periphery of the jetting port 130 by a second heater 190. <P>COPYRIGHT: (C)2013,JPO&INPIT |
