发明名称 LOADING UNIT AND TREATMENT SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To provide a loading unit capable of suppressing an increase in the cost of a lifting elevator mechanism by avoiding the necessity to enhance the performance of the lifting elevator mechanism. <P>SOLUTION: A loading unit is configured such that a substrate holder 58, which holds a plurality of substrates W so as to perform heat treatment on the substrates W, is lifted/lowered with respect to a cylindrical treatment container. The loading unit comprises: a lifting elevator mechanism which holds and lifts/lowers the substrate holder and a cap 62; and a pressing mechanism 86 which is provided to upwardly press the cap positioned at an opening 44 at the lower end of the treatment container, and which has a piezoelectric actuator 88 using a piezoelectric element. Consequently, the necessity to enhance the performance of the lifting elevator mechanism is avoided, thereby suppressing an increase in the cost of the lifting elevator mechanism. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012222098(A) 申请公布日期 2012.11.12
申请号 JP20110085205 申请日期 2011.04.07
申请人 TOKYO ELECTRON LTD 发明人 KIKUCHI HIROSHI
分类号 H01L21/22;C23C16/44;H01L21/324;H01L21/683 主分类号 H01L21/22
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