发明名称 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DISPLAY PANEL SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To uniformize a lifetime of each semiconductor light-emitting element while keeping intensity of exposure light constant when the exposure light is formed by using a plurality of semiconductor light-emitting elements. <P>SOLUTION: Intensity of exposure light irradiated from an exposure light irradiating device 30 is detected while temperature of each semiconductor light-emitting element 42 is detected. On the basis of teh detecting result of the temperature of each of the semiconductor light-emitting elements 42, lighting time of the semiconductor light-emitting elements of which the temperature is lower than a predetermined temperature or a predetermined temperature range is made to be longer than the lighting time of the semiconductor light-emitting elements of which the temperature is higher than the predetermined temperature or the predetermined temperature range, or driving current of the semiconductor light-emitting elements of which the temperature is lower than the predetermined temperature or the predetermined temperature range is made to be larger than the driving current of the semiconductor light-emitting element of which the temperature is higher than the predetermined temperature or the predetermined temperature range. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012220619(A) 申请公布日期 2012.11.12
申请号 JP20110084434 申请日期 2011.04.06
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 YOSHIDA MINORU
分类号 G03F7/20;G02F1/13;H01L21/027 主分类号 G03F7/20
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