发明名称 |
EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DISPLAY PANEL SUBSTRATE |
摘要 |
<P>PROBLEM TO BE SOLVED: To uniformize a lifetime of each semiconductor light-emitting element while keeping intensity of exposure light constant when the exposure light is formed by using a plurality of semiconductor light-emitting elements. <P>SOLUTION: Intensity of exposure light irradiated from an exposure light irradiating device 30 is detected while temperature of each semiconductor light-emitting element 42 is detected. On the basis of teh detecting result of the temperature of each of the semiconductor light-emitting elements 42, lighting time of the semiconductor light-emitting elements of which the temperature is lower than a predetermined temperature or a predetermined temperature range is made to be longer than the lighting time of the semiconductor light-emitting elements of which the temperature is higher than the predetermined temperature or the predetermined temperature range, or driving current of the semiconductor light-emitting elements of which the temperature is lower than the predetermined temperature or the predetermined temperature range is made to be larger than the driving current of the semiconductor light-emitting element of which the temperature is higher than the predetermined temperature or the predetermined temperature range. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2012220619(A) |
申请公布日期 |
2012.11.12 |
申请号 |
JP20110084434 |
申请日期 |
2011.04.06 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
YOSHIDA MINORU |
分类号 |
G03F7/20;G02F1/13;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|