| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing apparatus using a single arm carrier device to achieve a high throughput. <P>SOLUTION: A carrier device 15 of a dry etching apparatus 1 carries a preprocessing tray 3 from main shelves 67b, 68b of a cassette 62 in a stock section 13 to a rotary stage 33, and after alignment processing at the rotary stage 33, carries the tray 3 to a plasma treatment section 11 through temporally placing sections 67c, 68c in the cassette 62. The carrier device 15 also carries the processed tray 3 from the plasma treatment section 11 to the main shelves 67b, 68b of the cassette 62 in the stock section 13. <P>COPYRIGHT: (C)2013,JPO&INPIT |
