| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an ion beam irradiation device and an ion beam irradiation method which can remove an entire damaged layer while suppressing loss of a sample other than the damaged layer. <P>SOLUTION: An ion beam irradiation device comprises: a sample stage 2 for supporting a sample 1; an electron beam irradiation mechanism 3 for irradiating the sample 1 supported by the sample stage 2 with electron beam EB; a light detection mechanism 4 for detecting wavelength of cathode luminescence light excited in the sample 1 by the electron beam EB applied by the electron beam irradiation mechanism 3; an inert gas ion beam irradiation mechanism 5 for irradiating a damaged layer of the sample 1 supported by the sample stage 2 with inert gas ion beam; and a control unit 6 for controlling irradiation amount of the inert gas ion beam IB applied by the inert gas ion beam irradiation mechanism 5 on the basis of wavelength of the cathode luminescence light detected by the light detection mechanism 4. <P>COPYRIGHT: (C)2013,JPO&INPIT |
