发明名称 FLAT LOWER BOTTOM ELECTRODE FOR PHASE CHANGE MEMORY CELL
摘要 A phase change memory cell having a flat lower bottom electrode and a method for fabricating the same. The method includes forming a dielectric layer over a substrate including an array of conductive contacts, patterning, a via having a low aspect ratio such that a depth of the via is less than a width thereof, to a contact surface of the substrate corresponding to each of the array of conductive contacts to be connected to access circuitry, etching the dielectric layer and depositing electrode material over the etched dielectric layer and within each via, and planarizing the electrode material to form a plurality of lower bottom electrodes on each of the conductive contacts.
申请公布号 US2012280197(A1) 申请公布日期 2012.11.08
申请号 US201213550091 申请日期 2012.07.16
申请人 BREITWISCH MATTHEW J.;JOSEPH ERIC A.;LAM CHUNG H.;LUNG HSIANG-LAN;SCHROTT ALEJANDRO G.;MACRONIX INTERNATIONAL COMPANY, LTD.;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BREITWISCH MATTHEW J.;JOSEPH ERIC A.;LAM CHUNG H.;LUNG HSIANG-LAN;SCHROTT ALEJANDRO G.
分类号 H01L45/00 主分类号 H01L45/00
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