发明名称 Vertical Structure Light Emitting Diode and Method for Manufacturing the Same
摘要 PURPOSE: A vertical light emitting diode and a manufacturing method thereof are provided to improve efficiency of a package process by forming a thickness of a street line to be less than that of a semiconductor structure region. CONSTITUTION: An n-type gallium nitride film(102) is formed on the lower side of an n-type electrode(101). An active layer(103) is formed on the lower side of the n-type gallium nitride film. A p-type gallium nitride film(104) is formed on the lower side of the active layer. A p-type electrode is formed on the lower side of the p-type gallium nitride film. A metal layer is formed on the lower side of the p-type electrode.
申请公布号 KR20120121951(A) 申请公布日期 2012.11.07
申请号 KR20110039866 申请日期 2011.04.28
申请人 发明人
分类号 H01L33/36;H01L33/22;H01L33/38 主分类号 H01L33/36
代理机构 代理人
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