发明名称 |
Vertical Structure Light Emitting Diode and Method for Manufacturing the Same |
摘要 |
PURPOSE: A vertical light emitting diode and a manufacturing method thereof are provided to improve efficiency of a package process by forming a thickness of a street line to be less than that of a semiconductor structure region. CONSTITUTION: An n-type gallium nitride film(102) is formed on the lower side of an n-type electrode(101). An active layer(103) is formed on the lower side of the n-type gallium nitride film. A p-type gallium nitride film(104) is formed on the lower side of the active layer. A p-type electrode is formed on the lower side of the p-type gallium nitride film. A metal layer is formed on the lower side of the p-type electrode.
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申请公布号 |
KR20120121951(A) |
申请公布日期 |
2012.11.07 |
申请号 |
KR20110039866 |
申请日期 |
2011.04.28 |
申请人 |
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发明人 |
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分类号 |
H01L33/36;H01L33/22;H01L33/38 |
主分类号 |
H01L33/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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