发明名称 Thin film transistor
摘要 A thin film transistor includes a gate insulating layer covering a gate electrode, a semiconductor layer in contact with the gate insulating layer, and impurity semiconductor layers which are in contact with part of the semiconductor layer and which form a source region and a drain region. The semiconductor layer includes a microcrystalline semiconductor layer formed on the gate insulating layer and a microcrystalline semiconductor region containing nitrogen in contact with the microcrystalline semiconductor layer. The thin film transistor in which off-current is small and on-current is large can be manufactured with high productivity.
申请公布号 US8304775(B2) 申请公布日期 2012.11.06
申请号 US20100716002 申请日期 2010.03.02
申请人 MIYAIRI HIDEKAZU;WATABE TAKEYOSHI;SHIMAZU TAKASHI;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 MIYAIRI HIDEKAZU;WATABE TAKEYOSHI;SHIMAZU TAKASHI
分类号 H01L29/04;H01L31/036;H01L31/0376;H01L31/20 主分类号 H01L29/04
代理机构 代理人
主权项
地址