发明名称 |
Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern |
摘要 |
A positive type resist composition for forming a high resolution resist pattern and a method of forming a resist pattern are provided which use a low-molecular-weight material as a base component, and a compound and a dissolution inhibitor that are each suitable for the positive type resist composition. Here, the compound is a non-polymer having a molecular weight of 500 to 3000, and is decomposed under the action of an acid to produce two or more molecules of a decomposition product having a molecular weight of 200 or more; the dissolution inhibitor comprises the compound; the positive type resist composition comprises the compound and the acid generator component; and the method of forming a resist pattern uses the positive type resist composition.
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申请公布号 |
US8304163(B2) |
申请公布日期 |
2012.11.06 |
申请号 |
US20100980914 |
申请日期 |
2010.12.29 |
申请人 |
SHIONO DAIJU;HIRAYAMA TAKU;OGATA TOSHIYUKI;MATSUMARU SHOGO;HADA HIDEO;TOKYO OHKA KOGYO CO., LTD. |
发明人 |
SHIONO DAIJU;HIRAYAMA TAKU;OGATA TOSHIYUKI;MATSUMARU SHOGO;HADA HIDEO |
分类号 |
G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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