发明名称 |
METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE WITH A FO-CUSSED PARTICLE BEAM |
摘要 |
The invention relates to a method for processing a substrate with a focussed particle beam which incidents on the substrate, the method comprising the steps of: (a) generating at least one reference mark on the substrate using the focused particle beam and at least one processing gas, (b) determining a reference position of the at least one reference mark, (c) processing the substrate using the reference position of the reference mark, and (d) removing the at least one reference mark from the substrate. |
申请公布号 |
WO2012146647(A2) |
申请公布日期 |
2012.11.01 |
申请号 |
WO2012EP57621 |
申请日期 |
2012.04.26 |
申请人 |
CARL ZEISS SMS GMBH;BRET, TRISTAN;SPIES, PETRA;HOFMANN, THORSTEN |
发明人 |
BRET, TRISTAN;SPIES, PETRA;HOFMANN, THORSTEN |
分类号 |
H01J37/304;G03F1/74;H01J37/305 |
主分类号 |
H01J37/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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