| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a reflective mask, which can simply form a light shielding region and can achieve highly accurate pattern transfer, without increasing a manufacturing process such as resist coating, drawing, developing and etching, and without needing to prepare a special mask blank; an ion beam device for the reflective mask; and the reflective mask. <P>SOLUTION: The method for manufacturing the reflective mask includes: a preparation step of preparing a reflective mask which has a substrate, a multilayer film formed on the substrate and an absorption layer formed into a pattern shape on the multilayer film; and a light shielding region forming step of irradiating the outer periphery of a circuit pattern region in which the pattern of the absorption layer is formed with an ion beam of hydrogen or helium, forming a low reflection part by disturbing the regularity of a periodic structure of the multilayer film, and forming the light shielding region in which the low reflection part and the absorption layer are laminated on the substrate. <P>COPYRIGHT: (C)2013,JPO&INPIT |
